# Question

Consider the data on wafer contamination and location in the sputtering tool shown in Table 2-2. Assume that one wafer is selected at random from this set. Let A denote the event that a wafer contains four or more particles, and let B denote the event that a wafer is from the center of the sputtering tool. Determine:

(a) P (A)

(b) P (A|B)

(c) P (B)

(d) P (B|C)

(e) P (A ∩ B)

(f) P (A U B)

(a) P (A)

(b) P (A|B)

(c) P (B)

(d) P (B|C)

(e) P (A ∩ B)

(f) P (A U B)

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