Twenty observations on etch uniformity on silicon wafers are taken during a qualification experiment for a plasma etcher. The data are as follows:

 

(a) Construct a 95 percent confidence interval estimate of σ².

(b) Test the hypothesis that σ² = 1.0. Use α = 0.05. What are your conclusions? 

(c) Discuss the normality assumption and its role in this problem.

(d) Check normality by constructing a normal probability plot. What are your conclusions?

Transcribed Image Text:

5.34 6.65 4.76 5.98 7.25 6.00 7.55 5.54 5.62 6.21 5.97 7.35 5.44 4.39 4.98 5.25 6.35 4.61 6.00 5.32