Silicon thin film are commonly formed by chemical vapor deposition of silane vapor (SiH4) onto a growling
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Question:
Silicon thin film are commonly formed by chemical vapor deposition of silane vapor (SiH4) onto a growling solid Si film. If the following chemical reaction occurs on the surface of the solid Si film, which of the follwing flux relationships are true in the stagnant gas phase above the wafer? ( SiH4(g) -> 2H2(g) + Si(s)),
a) NSiH4 = -2NH2,
b) NSiH4 = 0.5NH2,
c) NSiH4 = 2NH2
d) NSiH4 = -0.5NH2
e) NSiH4 = -NSi
f) NSiH4 = NSi
Related Book For
Fundamentals Of Momentum Heat And Mass Transfer
ISBN: 9781118947463
6th Edition
Authors: James Welty, Gregory L. Rorrer, David G. Foster
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