A silicon chip (k = 150 W/m K, p = 2300 kg/m 3 , c p

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A silicon chip (k = 150 W/m ∙ K, p = 2300 kg/m3, c p = 700 J/kg ∙ K), 10 mm on a side and 1 mm thick, is connected to a substrate by solder balls (k = 40 W/m ∙ K. p = 10,000 kg/m3, c p = 150 J/kg ∙ K) of I mm diameter, and during an accelerated thermal stress test, the system is exposed to the flow of a dielectric liquid (k = 0.064 W/m ∙ K. v = 10-6 m2/s, Pr = 25). As first approximations, treat the top and bottom surfaces of the chip as flat plates in turbulent, parallel flow and assume the substrate and lower chip surfaces to have a negligible effect on flow over the solder balls. Also assume point contact between the chip and the solder, thereby neglecting heat transfer by conduction between the components.

- Silicon chip, T, 1= 1 mm- Solder ball D = 1 mm L= 10 mm Dielectric T. fluid Substrate

(a) The stress test begins with the components at ambient temperature (Ti = 20°C) and proceeds with heating by the fluid at T = 80°C. If the fluid velocity is V = 0.2 m/s, estimate the ratio of the time constant of the chip to that of a solder ball. Which component responds more rapidly to the heating process?

(b) The thermal stress acting on the solder joint is proportional to the chip-to-solder temperature difference. What is this temperature difference 0.25s after the start of heating?

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Fundamentals of Heat and Mass Transfer

ISBN: 978-0471457282

6th Edition

Authors: Incropera, Dewitt, Bergman, Lavine

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