Silicon dioxide is also used as a masking material in microfabrication If a silicon substrate with an SiO 2 mask is wet etched by HNO 3 HF, one of the reactions that takes place will be between SiO 2 and HF Provide a reasonable explanation as to why SiO 2 can be used as a mask even though it will r...

The rate at which the silic ...

Silicon dioxide is also used as a masking material in microfabrication. If a silicon substrate with an

Question:

Silicon dioxide is also used as a masking material in microfabrication. If a silicon substrate with an SiO₂ mask is wet etched by HNO₃/HF, one of the reactions that takes place will be between SiO₂ and HF. Provide a reasonable explanation as to why SiO₂ can be used as a mask even though it will react with the etchant.

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