A plasma etcher has a yield of good chips that is influenced by pressure (X1) and gas flow rate X2). Both X1 and X2 arc scaled variables (0 ? Xi ? 2). A model has been developed based on operating data as follows:Use Excel to maximize yield Y, using starting points of (1,1) and (0,0).

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Y = -0.1x+ 0.2X2X - 0.09X -- 0.11X{ + 0.15X; + 0.5