Many processes such as the fabrication of integrated circuits are carried out in a vacuum chamber to avoid reaction of the material with oxygen in the atmosphere. It is difficult to routinely lower the pressure in a vacuum chamber below 1.0 × 10⁻¹⁰ Torr. Calculate the molar density at this pressure at 300. K. What fraction of the gas phase molecules initially present for 1.0 atm in the chamber are present at 1.0 × 10⁻¹⁰ Torr?