Semiconductor manufacturing factories use a plasma equipment for etching or deposition. The plasma load is varying...

  

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Semiconductor manufacturing factories use a plasma equipment for etching or deposition. The plasma load is varying to the chemical and physical conditions. In the plasma system, the voltage source (1), the matching network (Zm), and the plasma load (Zo) are modelled as follows. Vs L m Zm Here, the load impedances (Zo) at 13.56MHz are 3[2], 3 + j50[2], and 3 - j50[2] in the three plasma conditions. The impedances are not changing with the frequency. The frequency of V, can be selected to one of 95%, 100%, and 105% of 13.56MHz. You should find one impedance network (Zm) for the voltage source to supply no reactive power for all the three load conditions. It means that the source supplies the minimum apparent power. Zm consists of one capacitor (C) and one inductor (L) in series as follows. (20 points) (a) Select the frequency for each load condition. (b) Find the values of L and C. O Zo HH (10pts) (10pts) Semiconductor manufacturing factories use a plasma equipment for etching or deposition. The plasma load is varying to the chemical and physical conditions. In the plasma system, the voltage source (1), the matching network (Zm), and the plasma load (Zo) are modelled as follows. Vs L m Zm Here, the load impedances (Zo) at 13.56MHz are 3[2], 3 + j50[2], and 3 - j50[2] in the three plasma conditions. The impedances are not changing with the frequency. The frequency of V, can be selected to one of 95%, 100%, and 105% of 13.56MHz. You should find one impedance network (Zm) for the voltage source to supply no reactive power for all the three load conditions. It means that the source supplies the minimum apparent power. Zm consists of one capacitor (C) and one inductor (L) in series as follows. (20 points) (a) Select the frequency for each load condition. (b) Find the values of L and C. O Zo HH (10pts) (10pts)