4. (20 pts). Predict how interconnect resistance, interconnecet capacitance and RC delay would change for a 90nm (A- 45 nm) processing using (from 180nm): (a) Ideal scaling and (b) Constant dimension scaling. Assume that S-0.5 Table: Interconnect scaling trends (S: scaling factor) ideal scaling constant dimension scaling line width and spacing wire thickness interlevel dielectric thickness wire length resistance per unit length capacitance per unit length RC delay current density iNS 1/s2 1/NS 1/s3 1/S 11S