Question: 5 . 3 . An X - ray exposure system uses photons with an energy of 1 keV . If the separation between the mask

5.3. An X-ray exposure system uses photons with an energy of 1 keV . If the separation between the mask and wafer is \(20\mu \mathrm{~m}\), estimate the diffraction-limited resolution that is achievable by this system.
5 . 3 . An X - ray exposure system uses photons

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