Question: 5 . 8 . As described in this chapter, there are no clear choices for lithography systems beyond optical projection tools based on 1 9
As described in this chapter, there are no clear choices for lithography systems beyond optical projection tools based on nm ArF eximer lasers. One possibility is an optical projection system using a mathrmnmmathrmF excimer laser.
a Assuming a numerical aperture of and k what is the expected resolution of such a system using a first order estimate of resolution?
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