Question: 5 . 8 . As described in this chapter, there are no clear choices for lithography systems beyond optical projection tools based on 1 9

5.8. As described in this chapter, there are no clear choices for lithography systems beyond optical projection tools based on 193-nm ArF eximer lasers. One possibility is an optical projection system using a \(157-\mathrm{nm}\mathrm{F}_{2}\) excimer laser.
a. Assuming a numerical aperture of 0.8 and \( k_{1}=0.75\), what is the expected resolution of such a system using a first order estimate of resolution?
5 . 8 . As described in this chapter, there are

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