c. What are the appropriate null and alternative hypotheses for this study? What is the decision rule using the critical number approach at the 0.05 level of significance? Make a sketch. Construct the ANOVA table. Show complete solutions for SST, SSTr, SSE, MSTr, MSE, F. Prove that there is sufficient evidence that different treatments have a significant effect on uniformity at a = 5% both by critical value and p-value approaches. STATISTICA output or PHSTAT output is also required. d. Perform an appropriate post-hoc analysis to determine which treatment means differ. Complete the Tukey-Kramer multiple pairwise comparisons by computing each absolute paired difference, the HSD (Q-critical range), and copy the corresponding p-value from STATISTICA results. Or submit the PHSTAT solution. Summarize your answer.Part 1: An experiment was conducted to determine the effect of Hexauoroethane CzFa ow rate on the uniformity of the etch on a silicon wafer used in integrated circuit manufacturing. Four ow rates (in standard cubic centimeter per minute) are used in the experiment and the resulting uniformity (in percent) is shown here