Name one commercial system which is capable of doing rapid thermal annealing for 300 mm silicon substrates. Explain briefly what rapid thermal annealing is and write your arguments why the system you have chosen would be the best for doing the rapid thermal annealing process after ion implantation on the 300 mm silicon substrates. Schematics or drawings can accompany the explanation.

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SILICON WAFER Silicon wafer can be used in the production and deep processing of dio... View the full answer