Question: Consider a process technology for which: Lmin = 0 . 4 m , tox = 8 nm , n = 4 5 0 cm 2

Consider a process technology for which: Lmin =0.4m, tox =8nm,n =450cm2N.s, VT= o.iv,)..=0,ox=3.45 x 1011 MaL Marks: SO i) Find Cox and Kn' ii)Find a MOSFETwith a (W/L)=(8m/0.8m), calculate the values of Vas and Vosmin needed to operate the transistor in saturation region with a DC current of Ios =100A. iii) For the device in (ii), find the value of Vas required to cause die device to operate as a I 0000 resistor for very small Vos.

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