The following figure shows the deposition rate of CVD as related to the process temperature. It...

  

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The following figure shows the deposition rate of CVD as related to the process temperature. It is divided into two regions (A&B) according to the rate-limiting factor. Which region (A&B) is limited by what factor? What is the effect of temperature and gas flow rate? TEMPERATURE (°C) 1300 1200 1100 1000 900 1.0T GROWTH RATE (m/min) 80 02 05 B - 0.2 -000 0.5- A 800 700 600 OSiH4 SIH2Cl2 ASIHC!3 Osicl4 مشم ° .01 0.7 0.8 0.9 1.0 1.1 10³/T(K) The following figure shows the deposition rate of CVD as related to the process temperature. It is divided into two regions (A&B) according to the rate-limiting factor. Which region (A&B) is limited by what factor? What is the effect of temperature and gas flow rate? TEMPERATURE (°C) 1300 1200 1100 1000 900 1.0T GROWTH RATE (m/min) 80 02 05 B - 0.2 -000 0.5- A 800 700 600 OSiH4 SIH2Cl2 ASIHC!3 Osicl4 مشم ° .01 0.7 0.8 0.9 1.0 1.1 10³/T(K)

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Solutions Step 1 Step 1 CVD stands for Chemical Vapor Deposition very much developing method in nanotechnology Here in this method we have a substrate reactant over which we wish to adhere the vapor o... View the full answer