Question: P 1 . ( 2 0 points ) An ideal MOS structure with di ( insulator ( SiO 2 ) thickness ) = 4 .

P1.(20 points) An ideal MOS structure with di (insulator (SiO2) thickness)=4.5 nm exhibit Vi (Voltage across insulator)=0.42 V at 1 V gate bias (applied VG). Calculate s (semiconductor surface potential), Qs (charges in the semiconductors), Es (electric field in the semiconductor surface), and Ei (electric field in the insulator).(Assume T =300K, the dielectric constant of Semiconductor, s, is 11.70,0=8.85x10-14 F/cm, sio2=3.90)

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