Question: P 1 . ( 2 0 points ) An ideal MOS structure with di ( insulator ( SiO 2 ) thickness ) = 4 .
P points An ideal MOS structure with di insulator SiO thickness nm exhibit Vi Voltage across insulator V at V gate bias applied VG Calculate s semiconductor surface potential Qs charges in the semiconductors Es electric field in the semiconductor surface and Ei electric field in the insulatorAssume T K the dielectric constant of Semiconductor, s is x Fcm sio
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