Question: Q 3 ( a ) Discuss the following lithography methods. ( a ) X - ray lithography ( b ) E - beam lithography (

Q3(a) Discuss the following lithography methods. (a) X-ray lithography (b) E-beam
lithography
(b) Discuss in detail the need of the actuators and the type of the actuators typically used for the active optical MEMS applications using suitable diagrams.
Q4(a) Discuss in detail about the PECVD technique for thin film deposition with neat
schematic diagram.
(b) What is the role of a photomask in a typical photolithography process? How are photomasks prepared?
Q5(a) Describe the Young's modulus (E), Bulk modulus (K), Shear modulus (G) and
Poisson's ratio and discuss about their relationship.
(b) Explain in detail about the basic modeling elements of a mechanical elements with necessary equations and diagrams.
Q6 Write short answer on following:
(8x2)
(a) LIGA.
(b) MEMS micromirror.
Q 3 ( a ) Discuss the following lithography

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