Question 2.5 To compare various dry-etching techniques, indicate below which effect(s) (listed in the first row) do the etching techniques (listed in the first column) use by putting a check mark or marks. a Sputtering Effect by Positive lons Chemical Reaction Effect 0, plasma etching of photoresist Reactive ion etching (RIE) XeF, vapor etching of silicon Vapor HF etching of Sio