Question: Why do developers for positive photoresist typically consist of basic solutions (i.e. pH > 7) such as NaOH and KOH? Why have NaOH- and
Why do developers for positive photoresist typically consist of basic solutions (i.e. pH > 7) such as NaOH and KOH? Why have NaOH- and KOH-based developers become less popular over time?
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Developers for positive photoresist which is a lightsensitive material used in photolithography processes typically consist of basic solutions with a ... View full answer
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