A polyimide photoresist requires 100 mJ / cm 2 per (m of thickness in order to develop

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A polyimide photoresist requires 100 mJ / cm² per (m of thickness in order to develop properly. How long does a 150 (m film need to develop when exposed by a 1000 W/m2 light source?

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Manufacturing Processes for Engineering Materials

ISBN: 978-0132272711

5th edition

Authors: Serope Kalpakjian, Steven Schmid

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Question Posted: Jul 18, 2016 09:26 AM

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A polyimide photoresist requires 100 mJ / cm 2 per (m of thickness in order to develop

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The power density P required per m m thickness of photoresist The total p...View the full answer

Manufacturing Processes for Engineering Materials

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