Question: An article in IEEE Transactions on Semiconductor Manufacturing (1992, Vol. 5, pp. 214222) described an experiment to investigate the surface charge on a silicon wafer.

An article in IEEE Transactions on Semiconductor Manufacturing (1992, Vol. 5, pp. 214€“222) described an experiment to investigate the surface charge on a silicon wafer. The factors thought to influence induced surface charge are cleaning method (spin rinse dry or SRD and spin dry or SD) and the position on the wafer where the charge was measured. The surface charge (×1011q / cm3) response data follow:


Test Position R 1.66 1.84 SD 1.90 1.84 1.92 1.62 Cleaning Method -4.21 -7.58 SRD -1.35 -2.20 -2.08 -5.36


(a) Estimate the factor effects.

(b) Which factors appear important? Use α = 0.05.

(c) Analyze the residuals from this experiment.

Test Position R 1.66 1.84 SD 1.90 1.84 1.92 1.62 Cleaning Method -4.21 -7.58 SRD -1.35 -2.20 -2.08 -5.36

Step by Step Solution

3.19 Rating (155 Votes )

There are 3 Steps involved in it

1 Expert Approved Answer
Step: 1 Unlock

a Estimated Effects and Coefficients for charge b Analysis of V... View full answer

blur-text-image
Question Has Been Solved by an Expert!

Get step-by-step solutions from verified subject matter experts

Step: 2 Unlock
Step: 3 Unlock

Students Have Also Explored These Related Applied Statistics and Probability Questions!