An article in IEEE Transactions on Semiconductor Manufacturing (1992, Vol. 5, pp. 214€“222) described an experiment to investigate the surface charge on a silicon wafer. The factors thought to influence induced surface charge are cleaning method (spin rinse dry or SRD and spin dry or SD) and the position on the wafer where the charge was measured. The surface charge (×10¹¹q / cm³) response data follow:

(a) Estimate the factor effects.

(b) Which factors appear important? Use α = 0.05.

(c) Analyze the residuals from this experiment.

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Test Position R 1.66 1.84 SD 1.90 1.84 1.92 1.62 Cleaning Method -4.21 -7.58 SRD -1.35 -2.20 -2.08 -5.36