The standard deviation of critical dimension thickness in semiconductor manufacturing is = 20 nm. (a) State
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The standard deviation of critical dimension thickness in semiconductor manufacturing is σ = 20 nm.
(a) State the null and alternative hypotheses used to demonstrate that the standard deviation is reduced.
(b) Assume that the previous test does not reject the null hypothesis. Does this result provide strong evidence that the standard deviation has not been reduced? Explain.
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Related Book For
Applied Statistics And Probability For Engineers
ISBN: 9781118539712
6th Edition
Authors: Douglas C. Montgomery, George C. Runger
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