Problem 6-21 describes a process improvement study in the manufacturing process of an integrated circuit. Suppose that only eight runs could be made in this process. Set up an appropriate 2^5-2 design and find the alias structure. Use the appropriate observations from Problem 6-21 as the observations in this design and estimate the factor effects. What conclusions can you draw?

Problem 6-21

An experiment was run in a semiconductor fabrication plant in an effort to increase yield. Five factors, each at two levels, were studied. The factors (and levels) were A = aperture setting (small, large), B = exposure time (20% below nominal, 20% above nominal), C = development time (30 s, 45 s), D = mask dimension (small, large), and E = etch time (14.5 min, 15.5 min). The unreplicated 25 design shown below was run.

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(1) = 7 d = 8 e = 8 de = 6 a = 9 ad = 10 ae = 12 ade = 10 %3D b = 34 bd = 32 be = 35 bde = 30 ab = 55 abd = 50 abe = 52 abde = 53 C = 16 cd = 18 ce = 15 cde = = 15 ac = 20 acd = 21 ace = 22 acde = 20 bc = 40 bcd = 44 bce = 45 bcde = 41 abc 60 abcd = 61 abce = 65 abcde = 63 %3D