Question: 1 . ( 2 5 points ) A process development team has almost completed development of a new fabrication process flow, but it is having
points A process development team has almost completed development of a new
fabrication process flow, but it is having trouble achieving a stable process meeting specification
limits for the critical dimension CD at an etching step. The team has set up statistical process
control based on sampling five positions on a wafer; the current control limits are LCL
angstroms and UCL angstroms.
The product to be produced in the process needs to meet specification limits for the etch CD
whereby LSL angstroms and USL angstroms. Company management faces two
choices: The development team could continue to work on the problem until the etch CD yield
limiter is better mitigated, or the process could be transferred into manufacturing as is with the
manufacturing team taking over responsibility for mitigating the etch CD problem.
At present, the overall yield, accounting for both line yield and die yield, is If transferred as
is it is estimated that ramp time to a mature yield of will be days. If the development
team continues to work on the problem, it is estimated that it will take them days to raise Cp
for the etch step to and raise Cpk for the etch step to at which time the process would be
transferred to manufacturing. It is estimated that, in that case, the ramp time after transfer to a
mature yield of will be only days.
It is estimated that the revenue per yielding wafer is declining per year and product
lifetime is two years if transfer from development to manufacturing is immediate; if transfer is
delayed by days, lifetime is reduced by days. Assume production volume will be constant
over the remaining lifetime of the product after transfer. It is estimated that the yield learning
rate in manufacturing after transfer is such that twothirds of the yield improvement towards
mature yield will be achieved halfway through the ramp time. This learning rate applies
regardless of the initial yield at time of transfer.
a points Lets define CDlimited yield of the etch step as the fraction of wafers meeting the
upper and lower specification limits for the CD Estimate the current CDlimited yield of the etch
step.
b points What are the current values of Cp and Cpk for the etch step?
c points If the development team continues to work on the etch CD problem to raise Cp for
the etch step to and raise Cpk for the etch step to but makes no other changes to the
process, estimate the overall yield when that work is done. You may assume the etch CD
mechanism is independent of other yield loss mechanisms.
d points Which choice should management make? Explain.
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