Question: 1 . ( 2 5 points ) A process development team has almost completed development of a new fabrication process flow, but it is having

1.(25 points) A process development team has almost completed development of a new
fabrication process flow, but it is having trouble achieving a stable process meeting specification
limits for the critical dimension (CD) at an etching step. The team has set up statistical process
control based on sampling five positions on a wafer; the current control limits are LCL =320
angstroms and UCL =396 angstroms.
The product to be produced in the process needs to meet specification limits for the etch CD
whereby LSL =320 angstroms and USL =375 angstroms. Company management faces two
choices: The development team could continue to work on the problem until the etch CD yield
limiter is better mitigated, or the process could be transferred into manufacturing as is, with the
manufacturing team taking over responsibility for mitigating the etch CD problem.
At present, the overall yield, accounting for both line yield and die yield, is 6%. If transferred as
is, it is estimated that ramp time to a mature yield of 90% will be 180 days. If the development
team continues to work on the problem, it is estimated that it will take them 30 days to raise Cp
for the etch step to 0.5 and raise Cpk for the etch step to 0.35, at which time the process would be
transferred to manufacturing. It is estimated that, in that case, the ramp time after transfer to a
mature yield of 90% will be only 135 days.
It is estimated that the revenue per 100%-yielding wafer is declining 75% per year and product
lifetime is two years if transfer from development to manufacturing is immediate; if transfer is
delayed by 30 days, lifetime is reduced by 30 days. Assume production volume will be constant
over the remaining lifetime of the product after transfer. It is estimated that the yield learning
rate in manufacturing after transfer is such that two-thirds of the yield improvement towards
mature yield will be achieved halfway through the ramp time. This learning rate applies
regardless of the initial yield at time of transfer.
(a) Lets define CD-limited yield of the etch step as the fraction of wafers meeting the
upper and lower specification limits for the CD. Estimate the current CD-limited yield of the etch
step.
(b) What are the current values of Cp and Cpk for the etch step?
(c) If the development team continues to work on the etch CD problem to raise Cp for
the etch step to 0.5 and raise Cpk for the etch step to 0.35 but makes no other changes to the
process, estimate the overall yield when that work is done. You may assume the etch CD
mechanism is independent of other yield loss mechanisms.
(d) Which choice should management make? Explain.

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