1) What is the difference between a grown and a deposited oxide layer? 2) Define thermal budget and explain why it is undesirable. 3) Describe the atomic structure for silicon dioxide. 4) What is surface passivation and why is it beneficial? 5) Describe the field oxide layer, and state its range of thickness. 6) Why is the gate oxide thermally grown? 7) Describe how SiO2 can be used as a dopant barrier. 8) State the chemical reaction for dry oxidation. At what temperature range does this reaction usually take place? 9) State the chemical reaction for wet oxidation. Is this faster or slower than dry oxidation? Why