3. What can be wrong with the following PR pattern? PR Substrate (a) Over developed. (b) Under developed. (c) UV exposure was not sufficient. (d) Above (b), or(c), or both (b) and (c). 4. How do you make the resist pattern using the pattern on the mask? Substrate Pattern on a photomask Resist pattem on the substrate (a) Use positive photoresist in lithography. (b) Use negative photoresist in lithography (C) Make a hole in the mask and spray resist through it. (d) We cannot make such a resist pattern using the above photomask