3.10 For the following process steps, assume that you use a positive photoresist and that etch...
Fantastic news! We've Found the answer you've been seeking!
Question:
Transcribed Image Text:
3.10 For the following process steps, assume that you use a positive photoresist and that etch selectivity is infinite. A composite plot of four photomasks is given in Fig. 3-26. Assume that mask alignment is perfect. All contact sizes are 0.5 x 0.5 um. The poly 1 and poly 2 areas are opaque, and the contact 1 and contact 2 areas are clear in the masks. Draw the cross section at the end of each process step along the cut line shown in the figure. A = 0.5 um Poly 1 mask Poly 2 mask Contact 1 mask Contact 2 mask FIGURE 3-26 (a) Grow 1 um thermal oxide on < 100 > bare Si wafer. (b) Expose and develop photoresist with contact 1 mask. Assume that the resist thickness is 1 um. (c) Etch the 1 um thermal oxide anisotropically. Assume the final oxide profile is perfectly vertical. (d) Remove the photoresist with O2 plasma. (e) Implant phosphorus and anneal. Assume that the final junction depth is 0.3 um. () Deposit 1 um in situ doped poly silicon by LPCVD. The thickness on the sidewalls is the same as that on the flat surface. (g) Expose and develop the photoresist with poly 1 mask. (h) Etch the 1 um poly silicon anisotropically. (1) Remove the photoresist with O2 plasma. ) Deposit 1 um oxide with PECVD. Again, the thickness on the sidewalls is the same as that on the flat surface. (k) Expose and develop photoresist with contact 2 mask. () Etch 0.2 um of the PECVD oxide with HF. Assume the profile is cylindrical as shown in Fig. 3-8a. (m) Etch the remaining 1.8 um oxide anisotropically. (n) Remove the photoresist with O2 plasma. (0) Implant phosphorus and anneal. Assume the junction depth is 0.3 um and there is no additional dopant diffusion. (p) Deposit 1 um in situ doped poly silicon by LPCVD. The thickness on the sidewalls is the same as that on the flat surface. (9) Expose and develop photoresist with poly 2 mask. (r) Etch the 1.0 um poly silicon anisotropically. (s) Remove the photoresist with O2 plasma. (This is just an exercise. The structure does not have any known usefulness.) 3.10 For the following process steps, assume that you use a positive photoresist and that etch selectivity is infinite. A composite plot of four photomasks is given in Fig. 3-26. Assume that mask alignment is perfect. All contact sizes are 0.5 x 0.5 um. The poly 1 and poly 2 areas are opaque, and the contact 1 and contact 2 areas are clear in the masks. Draw the cross section at the end of each process step along the cut line shown in the figure. A = 0.5 um Poly 1 mask Poly 2 mask Contact 1 mask Contact 2 mask FIGURE 3-26 (a) Grow 1 um thermal oxide on < 100 > bare Si wafer. (b) Expose and develop photoresist with contact 1 mask. Assume that the resist thickness is 1 um. (c) Etch the 1 um thermal oxide anisotropically. Assume the final oxide profile is perfectly vertical. (d) Remove the photoresist with O2 plasma. (e) Implant phosphorus and anneal. Assume that the final junction depth is 0.3 um. () Deposit 1 um in situ doped poly silicon by LPCVD. The thickness on the sidewalls is the same as that on the flat surface. (g) Expose and develop the photoresist with poly 1 mask. (h) Etch the 1 um poly silicon anisotropically. (1) Remove the photoresist with O2 plasma. ) Deposit 1 um oxide with PECVD. Again, the thickness on the sidewalls is the same as that on the flat surface. (k) Expose and develop photoresist with contact 2 mask. () Etch 0.2 um of the PECVD oxide with HF. Assume the profile is cylindrical as shown in Fig. 3-8a. (m) Etch the remaining 1.8 um oxide anisotropically. (n) Remove the photoresist with O2 plasma. (0) Implant phosphorus and anneal. Assume the junction depth is 0.3 um and there is no additional dopant diffusion. (p) Deposit 1 um in situ doped poly silicon by LPCVD. The thickness on the sidewalls is the same as that on the flat surface. (9) Expose and develop photoresist with poly 2 mask. (r) Etch the 1.0 um poly silicon anisotropically. (s) Remove the photoresist with O2 plasma. (This is just an exercise. The structure does not have any known usefulness.)
Expert Answer:
Related Book For
Posted Date:
Students also viewed these business communication questions
-
The energy needed for the following process is 1.96 104 kJ/mol: Li(g) Li3+(g) + 3e- If the first ionization energy of lithium is 520 kJ/mol, calculate the second ionization energy of lithium, that...
-
Prepare a flowchart using Lucid Chart for the following process for a credit sale. The process begins when the sales clerk assist customers and prepares a sales invoice (original plus 3 copies)....
-
Would you use a positive lens or a negative lens to correct the vision of a farsighted person? Explain.
-
Exercises 11-16: For the measured quantity, state the set of numbers that most appropriately describes it. Choose from the natural numbers, integers, and rational numbers. Explain your answer....
-
Suppose that, for a sample of size n = 100 measurements, we find that x-bar = 50. Assuming that s equals 2, calculate confidence intervals for the population mean m with the following confidence...
-
Access the FASS Standards Codification at the FASB website (adc.fash.org). Required: Determine the specific citation for accounting for each of the following items: 1. On what basis is a contract's...
-
Describe how trend analysis can provide insight on whether a firm's financial position is improving or deteriorating.
-
Digiread Technologies Ltd. (DTL) is a privately held distributor of e-readers and tablets. The Calgary-based company is well established and is currently managed by its founder, Erin Jacobs. The...
-
You are considering a project that requires a capital investment of $100 and will last for three years. Economical depreciation is straight line over 3 years (33.3% in each of the 3 years)) while tax...
-
Let today be November 3, 2008. (a) Use the LIBOR rate and the swap data on November 3, 2008 in Table 11.26 and fit the LIBOR curve. (b) From the LIBOR discount curve, fit the Ho-Lee model of the...
-
Cognitive dissonance refers to the discomfort we experience when we hold conflicting beliefs or engage in behavior that conflicts with a belief. One of our principal motivations is the drive to...
-
Include any type of a visual in the body of your paper to further illustrate the current event or macroeconomic concept you are addressing. Examples could include: a graph, chart, table, model,...
-
The prices of cigarettes and alcohol have experienced sharp increases in price over the last seven years. In spite of these price increases the revenue of these companies has continued to increase....
-
A car is entering a circularly shaped on ramp which is unbanked and has a radius of curvature of 316m. If the coefficient of static friction between the wheels of the car and the road is 0.8. what is...
-
According to Jim Myers, president of the American Chamber of Commerce in South Africa, nearly 50% of the chambers members are Fortune 500 companies, and that over 90% operate beyond South Africas...
-
How Paul Baran defines wellness? How can we achieve that kind of well-being today through the surplus?
-
Do you think zoom should introduce automated features to deactivate or expire old meeting links to reduce the reliance on manual actions by the host? what other technological solutions could enhance...
-
PC Contractors, Inc., was an excavating business in Kansas City, Missouri. Union Bank made loans to PC, subject to a perfected security interest in its equipment and other assets, including...
-
Based on oxidation number consideration, explain why carbon monoxide (CO) is flammable but carbon dioxide (CO2) is not.
-
An acidified solution was electrolyzed using copper electrodes. A constant current of 1.18 A caused the anode to lose 0.584 g after 1.52 3 103 s. (a) What is the gas produced at the cathode and what...
-
Fill in the blanks in the following table: 54 Symbol Protons Neutron:s Electrons Net charge 79 86 16 117136 1879
-
Trans Clothing Alterations began operations on 1 August 2024 and completed the following transactions during the first month. 1. Tran deposited \($18\) 000 of her personal funds in a current account...
-
Finesse Fitness was established on 1 April 2024 with an initial investment of $60000 by the owner, Daniel Hewitt. During the first few months of business, the owner employed a student studying...
-
Jason Vu offers tutoring services to first-year university students. He has set up a sole proprietorship business named JV Tutoring. Jason has collected the following information relating to his...
Study smarter with the SolutionInn App