Question: A scrubber is used to remove particles from a wafer surface in semiconductor processing. An engineer would like to determine the most important variables that

A scrubber is used to remove particles from a

A scrubber is used to remove particles from a wafer surface in semiconductor processing. An engineer would like to determine the most important variables that optimize the scrubber's ability to remove particles. There are 8 factors that can be manipulated. The engineer does not want to spend too much time doing this experiment. Given the following data: Levels 500 1500 Units RPM RPM RPM 10 25 500 10 Sec Factors A: Pre-Rinse Speed (PRS) B: Pre-Rinse Time (PRT) C: Scrub Speed (SRS) D: Scrub Time (SRT) Post-Rinse Speed (PSRS) F: Post-Rinse Time (PSRT) G: Dry Speed (DRS) H: Dry Time (DRT) 500 1500 - 50 1500 25 5000 50 E: 10 RPM Sec RPM Sec 4000 25 Note: The interactions of interest are AB, CD, EF, and GH (a) Generate the most effective screening experiment. (b) What is the defining relationship? (C) Are any of your important interactions aliased with any main effects? (d) What is the resolution of your design? A scrubber is used to remove particles from a wafer surface in semiconductor processing. An engineer would like to determine the most important variables that optimize the scrubber's ability to remove particles. There are 8 factors that can be manipulated. The engineer does not want to spend too much time doing this experiment. Given the following data: Levels 500 1500 Units RPM RPM RPM 10 25 500 10 Sec Factors A: Pre-Rinse Speed (PRS) B: Pre-Rinse Time (PRT) C: Scrub Speed (SRS) D: Scrub Time (SRT) Post-Rinse Speed (PSRS) F: Post-Rinse Time (PSRT) G: Dry Speed (DRS) H: Dry Time (DRT) 500 1500 - 50 1500 25 5000 50 E: 10 RPM Sec RPM Sec 4000 25 Note: The interactions of interest are AB, CD, EF, and GH (a) Generate the most effective screening experiment. (b) What is the defining relationship? (C) Are any of your important interactions aliased with any main effects? (d) What is the resolution of your design

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