Question: ed Question 40 0/1 pts What process must eventually follow an ion implant process in order to activate the implanted dopant? O Plasma etch Organic

 ed Question 40 0/1 pts What process must eventually follow an

ed Question 40 0/1 pts What process must eventually follow an ion implant process in order to activate the implanted dopant? O Plasma etch Organic stress relief O Magnetic separation and enhancement Rapid thermionic emmission Anneal

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