Germanium doped with trace amounts of other elements are widely used in semiconductor, fiber-optic , infrared-optic and the microelectronics industry. These uses may require 0-20 parts per million (ppm) of impurities in the base metallic structure. Germanium rods may be grown by the following chemical deposition reaction of tetrachloride with hydrogen:

                                GeCl₄ + 2H₂ → 4HCl + Ge

Reactants are fed separately to the reactor. Draw a flowchart of the process and conduct a DOF analysis. Determine the volume of hydrogen at 1000°C and 1 atm required for increasing the diameter of a rod 1 m long from 1 cm to 5 cm? The density of solid germanium is 5.32 g/cm³ with AW=72.63 gr/mol.