Introducing impurities into silicon can be done using a number of different techniques. Circle any of the following process steps that would be required in any of these techniques. Please circle all the answers that you think are correcta$)$ Ion implantationb$)$ High temperature annealingc$)$ LPCVD depositiond$)$ Thermal evaporatione$)$ Pre$-$depositionf$)$ All of the above