please help about deal grove model thermal oxidation problem,,,,,,,,,,

Problem 2 Thermal oxidation (25 points total) We are interested in the oxide thickness difference ( X2-X1) after thermal oxidation of an oxide window on a Si wafer. Thermal Oxidation SiO2 X2 Si02 X Si Si (a) (4 points) Use the Deal-Grove Model result xox 2 + A Xox =B (t+t) to show that: A+x (x2 - X) = xo . A+x+ X2 (b) (3 points) Can ( X2 - x) be larger than x, ? Explain. (c) (3 points) For very long oxidation time (t+0), what will be the value of ( x2 - xi) ? (d) (3 points) Expressed the surface oxide step height A in terms of x, X1, and X2. Problem 2 Thermal oxidation (25 points total) We are interested in the oxide thickness difference ( X2-X1) after thermal oxidation of an oxide window on a Si wafer. Thermal Oxidation SiO2 X2 Si02 X Si Si (a) (4 points) Use the Deal-Grove Model result xox 2 + A Xox =B (t+t) to show that: A+x (x2 - X) = xo . A+x+ X2 (b) (3 points) Can ( X2 - x) be larger than x, ? Explain. (c) (3 points) For very long oxidation time (t+0), what will be the value of ( x2 - xi) ? (d) (3 points) Expressed the surface oxide step height A in terms of x, X1, and X2