Question: QUESTION 3 a) State two (2) common silicon precursors that are used to produce deposited silicon dioxide. (2 marks) b) Briefly explain the purpose of

QUESTION 3 a) State two (2) common silicon precursors that are

QUESTION 3 a) State two (2) common silicon precursors that are used to produce deposited silicon dioxide. (2 marks) b) Briefly explain the purpose of a reflow process that is done after the pre-metal dielectric film deposition. (4 marks)

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