Six samples with individual observations have been collected on the oxide thickness of silicon wafers, as shown in the following table Sample 54.3 57 5 3 64.8 4 62.1 5. 59.6 6. 51.5 A two-sided tabular Cusum control chart is to be constructed for the data using a 40% headstart to detect a shift of lo. Assume the target thickness is 60, h = 4, and the standard deviation is 5. The value of Ce is equal to Oa 23 b. 11.2 C. 0 d. 6 e. 1.9