Question: Todays chip requires us to create tiny lines and patterns on the silicon wafer. This has led to the introduction of the extreme ultraviolet (EUV)
Todays chip requires us to create tiny lines and patterns on the silicon wafer. This has led to the introduction of the extreme ultraviolet (EUV) lithography tool. Briefly explain how the EUV tool works, and why does it use mirrors to focus the generated light instead of using conventional lenses system like in previous technology such as DUV (Deep ultraviolet).
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