A rapid thermal processing system for microelectronic manufacturing uses three concentric lamp heater arrays to keep the

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A rapid thermal processing system for microelectronic manufacturing uses three concentric lamp heater arrays to keep the wafer temperature uniform. The gain matrix for the system is:The system experiences difficulties in controlling all three temperatures uniformly. Examine possible control difficulties using RGA and SVAanalyses.image

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Process Dynamics And Control

ISBN: 978-0471000778

2nd Edition

Authors: Dale E. Seborg, Thomas F. Edgar, Duncan A. Mellich

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