Question: A rapid thermal processing system for microelectronic manufacturing uses three concentric lamp heater arrays to keep the wafer temperature uniform. The gain matrix for the

A rapid thermal processing system for microelectronic manufacturing uses three concentric lamp heater arrays to keep the wafer temperature uniform. The gain matrix for the system is:The system experiences difficulties in controlling all three temperatures uniformly. Examine possible control difficulties using RGA and SVAanalyses.3.38 2.50 K =3.20 2.38 0.986 3.13 2.33 0.953 1.054

3.38 2.50 K =3.20 2.38 0.986 3.13 2.33 0.953 1.054

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