A vacuum system, as used in sputtering electrically conducting thin films on microcircuits, is comprised of a baseplate maintained by an electrical heater at \(400 \mathrm{~K}\) and a shroud within the enclosure maintained at \(97 \mathrm{~K}\) by a liquid-nitrogen coolant loop. The circular baseplate, insulated on the lower side, is \(0.3 \mathrm{~m}\) in diameter and has an emissivity of 0.25.

(a) How much electrical power must be provided to the baseplate heater?

(b) At what rate must liquid nitrogen be supplied to the shroud if its heat of vaporization is \(125 \mathrm{~kJ} / \mathrm{kg}\) ?

(c) To reduce the liquid nitrogen consumption, it is proposed to bond a thin sheet of aluminum foil \((\varepsilon=0.09)\) to the baseplate. Will this have the desired effect?

Transcribed Image Text:

Electrical heater Baseplate Vacuum enclosure Liquid-nitrogen filled shroud LN