$$A p$-$type $($Boron$)$ Diffusion is performed as follows.

Predep: $30$ min, $900$C$,$ solid solubility

Drive in: $60$ min, $1000$C

$($a$)$ What is the deposited dose Q$?$

$($b$)$ If the substrate is doped $11015$ cm$3$ phosphorus, what is the junction depth xj $?$

$($c$)$ What is the sheet resistance of the diffused layer?,