An experiment was run in an effort to increase yield. Five factors, each at two levels, werestudied. The factors $($and levels$)$ were A $=$ aperture setting $($small$,$ large$),$ B $=$ exposure time $(20\%$ belownominal, $20\%$ above nominal$),$ C $-$ development time $(30$ s$,45$ s$),$ D $=$ mask dimension $($small$,$ large$),$ andE $=$ etch time $(14\mathrm{.}5$ min, $15\mathrm{.}5$ min$).$ The unreplicated $2$ design shown below was run.