Question: P- (d) Find a 95 percent confidence interval on the difference in the mean fill volume for the two machines. (2 pts) Show your calculations

P- (d) Find a 95 percent confidence interval on
P- (d) Find a 95 percent confidence interval on the difference in the mean fill volume for the two machines. (2 pts) Show your calculations 10. An article in Solid State Technology, "Orthogonal Design of Process Optimization and its Application to Plasma Etching" by G.Z. Yin and D. W. Killie (May, 1987) describes an experiment to determine the effect of C;F.flow rate on the uniformity of the etch on a silicon wafer used in integrated circuit manufacturing. Data for two flow rates are as follows: CsF (SCCM) 125 200 1 2.7 4.6 2 4.6 3.4 Uniformity Observation 3 4 2.6 3.0 2.9 3.5 5 3.2 6 3.8 5.1 (10 pts) Show your calculations. (a) Does the CF. flow rate affect average etch uniformity? Use a 0.05. (b) What is the P-value for the test in part (a)? (c) Does the CF. flow rate affect the wafer-to-wafer variability in etch uniformity? Use a 0.05. (d) Draw box plots to assist in the interpretation of the data from this experiment

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