a) Describe at least two ways in which the CMP process improves photolithography. b) In a...

 

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a) Describe at least two ways in which the CMP process improves photolithography. b) In a particular positive resist process, it is sometimes noticed that there is difficulty developing away the last few hundred Angstroms of resist in exposed areas. This sometimes causes etching problems because the resist remains in the areas to be etched. Suggest a possible cause of this problem and therefore propose a solution a) Describe at least two ways in which the CMP process improves photolithography. b) In a particular positive resist process, it is sometimes noticed that there is difficulty developing away the last few hundred Angstroms of resist in exposed areas. This sometimes causes etching problems because the resist remains in the areas to be etched. Suggest a possible cause of this problem and therefore propose a solution