Question: Consider an ideal MOS capacitor maintained at T = 3 0 0 K with the following parameters: Gate material is p + polycrystalline - silicon

Consider an ideal MOS capacitor maintained at T =300K with the following parameters: Gate material is p+ polycrystalline-silicon (work function M =5.2 eV) Substrate is n-type Si, with doping concentration 1018 cm-3(assume that this is nondegenerate) Oxide thickness xo =2 nm. Dielectric constant =3.9. Si bandgap =1.12 eV. ni=1e10 cm-3. Electron affinity=4.05 eV. Dielectric constant =11.3. Assume no oxide charges. a) What is the flat-band voltage, VFB, of this capacitor?

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