Question: Consider an ideal MOS capacitor maintained at T = 3 0 0 K with the following parameters: Gate material is p + polycrystalline - silicon
Consider an ideal MOS capacitor maintained at T K with the following parameters: Gate material is p polycrystallinesilicon work function M eV Substrate is ntype Si with doping concentration cmassume that this is nondegenerate Oxide thickness xo nm Dielectric constant Si bandgap eV nie cm Electron affinity eV Dielectric constant Assume no oxide charges. a What is the flatband voltage, VFB of this capacitor?
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