Question: Consider silicon at T = 3 0 0 K that is doped with donor impurity atoms to a concentration of N d = 1 1

Consider silicon at T=300K that is doped with donor impurity atoms to a concentration of Nd=11017cm-3, the intrinsic carrier concentration is ni=11010cm-3, the excess carrier lifetime is 110-6s.
If we add excess electrons and holes so that n=p=1012cm-3, is the semiconductor in low-level injection? Explain why or why not. (10pt)
Where are the quasi-Fermi levels, Fn and Fp located with respect to the intrinsic, Ei? Provide the numerical value and show the Fn and Fp on the energy band diagram below. (10pt)
Determine the thermal equilibrium recombination rate of holes. (10pt)
Excess carriers are generated such that n=p=1012cm-3. What is the recombination rate of holes for this condition? (10pt)
Consider silicon at T = 3 0 0 K that is doped

Step by Step Solution

There are 3 Steps involved in it

1 Expert Approved Answer
Step: 1 Unlock blur-text-image
Question Has Been Solved by an Expert!

Get step-by-step solutions from verified subject matter experts

Step: 2 Unlock
Step: 3 Unlock

Students Have Also Explored These Related Electrical Engineering Questions!