Question: 1 - An n + - polysilicon - gate n - channel Si - MOSFET with substrate doping NA = 5 x 1 0 1

1- An n+-polysilicon-gate n-channel Si-MOSFET with substrate doping
NA=5x1015 cm-3. The insulator is SiO2, and its thickness is 400 A. The
interface charge Qox =5x1010 qC/cm2, the gate length is 1 um, and the
gate width is 40 um
(a) Find Wm, VFB, and VT.
(b) For VG=5V, obtain the current at VD=1V.
(c) For VG=5V,(i) find the saturation current, (ii) the current at
pinch-off, and (iii) the current at VD=5V.
(d) Are the currents in (C) equal to each other? Should they should
be equal, or this is just a coincident? Explain.
(e) Is this device enhancement or depletion mode device?

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