Question: 2 11 ATW layer is deposited on a substrate using a sputtering tool. Table 2 contains layer thickness measurements in Angstroms) on 15 subgroups of

2 11 ATW layer is deposited on a substrate using
2 11 ATW layer is deposited on a substrate using a sputtering tool. Table 2 contains layer thickness measurements in Angstroms) on 15 subgroups of four substrates Table 2 Subgroup x1 X3 X4 Sample Sample Mean 459 449 435 Range 450 2 444 441 441 442 3 455 443 447 446 4 442 451 4418 439 5 442 458 451 6 444 455 451 458 7 447 451 8 451 457 442 9 456 439 457 10 2013 442 448 11 453 450 439 12 42 442 14 465 15 461 448 $3$ 51398 450 440 Copy the table in the Answer box and fill in the cells and then compute the required values) (a) Calculate the control limits for X bar and control chart is the process in control if not find out of control points and suggest the next step ft Mark b) Estimate the mean and standard deviation of the process. (6 Marks if the specifications are at 4500 Angstrom estimate the process capability and provide your comment on the process capability (6 Marks

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