Question: . A TiW layer is deposited on a substrate using a sputtering tool. The table below contains layer thickness measurements (in Angstroms) on 20 subgroups

. A TiW layer is deposited on a substrate using a sputtering tool. The table below contains layer thickness measurements

(in Angstroms) on 20 subgroups of four substrates.

Subgroup X1 x2 J3 14 1 459 449 435 450 2 443

(b) Estimate the mean and standard deviation of the process.

(c) Is the layer thickness normally dis-
tributed?

(d) If the specifications are at 450 + 30, estimate the process capability.

Subgroup X1 x2 J3 14 1 459 449 435 450 2 443 440 442 442 3 457 444 449 444 4 469 463 453 438 5 443 457 445 454 6 444 456 456 457 7 445 449 450 445 8 446 455 449 452 9 444 452 457 440 10 432 463 463 443 11 445 452 453 438 12 456 457 436 457 13 459 445 441 447 14 441 465 438 450 15 460 453 457 438 16 453 444 451 435 17 451 460 450 457 18 422 431 437 429 19 444 446 448 467 20 450 450 454 454 (a) Set up and R control charts on this process. Is the process in control? Revise the control limits as neces- sary.

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